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Monday, October 19, 2020 | History

2 edition of surface properties of oxidized silicon. found in the catalog.

surface properties of oxidized silicon.

Else Kooi

surface properties of oxidized silicon.

by Else Kooi

  • 203 Want to read
  • 11 Currently reading

Published by Philips Technical Library in [Eindhoven] .
Written in English

    Subjects:
  • Silicon.,
  • Silica.

  • Edition Notes

    Statement[By] E. Kooi.
    SeriesPhilips technical library
    Classifications
    LC ClassificationsQD181.S6 .K63 1967b
    The Physical Object
    Pagination144 p.
    Number of Pages144
    ID Numbers
    Open LibraryOL5549648M
    LC Control Number67028721

    Abstract. A detailed study has been made of factors affecting the surfaces of oxidized silicon. In particular an investigation has been made into the mechanism by which parasitic n-type layers are formed by mobile excess electrons near the surface due to donors, created by the diffused excess ocygen near the oxidized silicon surface. Silicon wafers are among the most commonly used flat surfaces for these grafting-from reactions and initiators can be attached to both kinds of silicon substrates, namely oxidized (Si-OH) or hydrogen-terminated silicon (Si-H).(4,5) Tethering a chlorosilane (mono- or trichloro) functionalized initiator to an oxidized substrate is the most.

    In this work, we investigated the effects of surface backbond-oxygen oxidation and surface substitute-carbon carbonization on carrier recombination and transportation of , and 14 Å Si quantum dots (QDs). In general, surface oxidation lowered the density of . Oxidation. Oxidation of 4H-SiC is a very important processing step during the manufacturing of a device. The performance of a metal-oxide semiconductor (MOS) device is dependent on the quality of the gate oxide layer. Out of many oxidation processes, thermal oxidation is the process most commonly used to form the interface (4H-SiC/SiO 2).Cited by: 1.

    2. Silicon Oxidation Techniques Oxidation is a process by which a metal or semiconductor is converted to an oxide. Although oxidation of many materials plays a role in technology, the main oxidation reaction which will be addressed is the conversion of parts of a silicon semiconductor wafer into silicon . Optical properties of silicon nanoparticles: Influence of etching, surface oxidation and surface functionalization Anoop Gupta*, Christof Schulz** and Hartmut Wiggers*** * Institute for Combustion and Gasdynamics (IVG), University of Duisburg-Essen, Duisburg, Germany, @or: Anoop Gupta, Sebastian Kluge, Christof Schulz, Hartmut Wiggers.


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Surface properties of oxidized silicon by Else Kooi Download PDF EPUB FB2

Buy The Surface Properties of Oxidized Silicon on FREE SHIPPING on qualified orders The Surface Properties of Oxidized Silicon: Else Kooi: : Books Skip to. General Review of the Effect of Silicon-Dioxide Coatings on the Surface Properties of Silicon and the Importance of these Coatings in Semiconductor-Device Technology E.

Kooi Pages General Review of the Effect of Silicon-Dioxide Coatings on the Surface Properties of Silicon and the Importance of these Coatings in Semiconductor-Device Technology Pages Kooi, : Springer-Verlag Berlin Heidelberg. Oxidiertes Silicon Academic theses: Additional Physical Format: Online version: Kooi, Else, Surface properties of oxidized silicon.

New York, Springer-Verlag [] (OCoLC) Material Type: Thesis/dissertation: Document Type: Book: All Authors / Contributors: Else Kooi. Electronic books Academic theses Oxidiertes Silicon: Additional Physical Format: Print version: Kooi, Else, Surface properties of oxidized silicon.

New York, Springer-Verlag [] (DLC) (OCoLC) Material Type: Document, Thesis/dissertation, Internet resource: Document Type: Internet Resource, Computer File: All Authors.

The surface properties of oxidized silicon () Pagina-navigatie: Main; Save publication. Save as MODS; Export to Mendeley; Save as EndNoteCited by: Fig. Surface effects on the reverse I-V characteristic of an n+ p diode. (a) Surface donors (often present in the case of oxidized silicon) may cause the presence of an n-type inversion layer on the p-type region.

(b) The presence of an inversion layer (V,~ 0) causes excess leakage of the pn by: Hydrogen termination of oxidized silicon in hydrofluoric acid results from an etching process that is now well understood and accepted.

This surface properties of oxidized silicon. book has become a standard for studies of surface science and an important component in silicon device processing for microelectronics, energy, and sensor applications. The present work shows that HF etching of oxidized silicon carbide (SiC) leads to a Cited by: The Electrochemical Society was founded in to advance the theory and practice at the forefront of electrochemical and solid state science and technology, and allied by: Silicon, in particular, spontaneously forms oxides at its surface that degrade photovoltaic and photoelectrochemical performance.

Thus, the goals of the surface chemistry subgroup are: Modify surfaces to reduce the degree of surface oxidation with chemically stable species. The ability to form a chemically stable protective layer of silicon dioxide (SiO 2) at the surface of silicon is one of the main reasons that make silicon the most widely used semiconductor material.

This silicon oxide layer is a high quality electrically insulating layer on the silicon surface, serving as a dielectric in numerous devices that can also be a preferential masking layer in many steps during Cited by: Ab initio restricted Hartree-Fock method within the framework of large unit cell formalism is used to simulate silicon nanocrystals between and atoms (– nm in diameter) that include Bravais and primitive cell multiples.

The investigated properties include core and oxidized surface properties. Results revealed that electronic properties converge to some limit as the size of Cited by: 8. Investigations carried out to study the influence of oxidation and further heat treatments on the surface properties of silicon suggest that hydrogen and sodium impurities have a considerable The Surface Charge in Oxidized Silicon | SpringerLinkCited by: 5.

Books. Publishing Support. Login. Resistance to room temperature oxidation and control over wetting properties can be achieved by chemical modification of a porous‐silicon surface.

Fourier transform infrared spectroscopy was used in the transmission mode to monitor the surface chemistry of both treated and untreated porous‐silicon. Native oxidation of silicon is known to have detrimental effects on ultra-large- scale integrated circuit (ULSIC) processes and properties including metal/silicon ohmic contact, the low-temperature epitaxy of silicide and dielectric breakdown of thin SiO 2 [3].

Influence of the oxidation on the surface properties of silicon carbide Author links open overlay panel K. Guerfi a S. Lagerge a M.J. Meziani a Y. Nedellec a G. Chauveteau b Show moreCited by: The paper deals with the optical and morphological properties of thermally oxidized black silicon (OBSi) nano-crystalline specimens produced by the surface structure chemical transfer method (SSCT).

Porous silicon has been intensely studied for the past several decades and its applications were found in photovoltaics, biomedicine, and sensors. An important aspect for sensing devices is their long–term stability. One of the more prominent changes that occur with porous silicon as it is exposed to atmosphere is oxidation.

In this work we study the influence of oxidation on the sensing Cited by: 3. Oxidation is the most commonly used method of passivating porous silicon (PSi) surfaces against unwanted reactions with guest molecules and temporal changes during storage or use.

In the present study, several oxidation methods were compared in order to find optimal methods able to generate inert surfaces free of reactive hydrides but would cause minimal changes in the pore structure of PSi Cited by: Properties of Silicon Carbide.

Annotation Current SiC research is being driven by the growing promise of applications in blue light diodes, integrated circuits operating at high temperatures, high power/high frequency devices, and quantum structures.3/5(1).

Downloadable (with restrictions)! Back surface passivation becomes a key issue for the silicon solar cells made with thin wafers. The high surface recombination due to the metal contacts can be lowered by reducing the back contact area and forming local back surface field (LBSF) in conjunction with the passivation with dielectric layer.

About 3×m thick porous silicon (PS) layer with pore.on oxidized, hydrophilic silicon surfaces. Based on experimental data and simulations, a mathematic model of the wetting property was then introduced. Results in this thesis are expected to provide better understandings of silicon surface properties and guidances for conducting surface treatments in the silicon direct : Xiaoning Xi.silicon.2,3,8,17 The transported species must go through the following stages: (1) It is transported from the bulk of the oxidizing gas to the outer surface where it reacts or is adsorbed.

(2) It is transported across the oxide film towards the silicon. (3) It reacts at the silicon surface to form a new layer of Si02•.